Direct current sputter deposited CuO layers on conductive glass: Towards a maximum photoelectrochemical response of photocathodes

Kim H, Schmuki P (2025)

Publication Type: Journal article

Publication year: 2025

Journal

Thin Solid Films Elsevier

Book Volume: 816

Article Number: 140655

DOI: 10.1016/j.tsf.2025.140655

Abstract

This study investigates the photoelectrochemical properties of copper-oxides and their use as photoelectrodes deposited onto conductive glass (fluorine-doped tin oxide) via reactive direct current magnetron sputtering. Through careful optimization of sputtering parameters, we hint that among various phases formed (Cu2O, Cu4O3 and CuO), an optimized cupric oxide layer can be grown that sputtered under an oxygen flow rate of 7 sccm exhibits the highest photoelectochemical activity that can reach a maximal incident photon-to-current efficiency of 12.3 %. A key factor in this optimization is the precise control of oxygen partial pressure, which facilitates the crystallization of CuxOy, leading to enhanced photoelectrochemical performance. Further improvements in efficiency were investigated by varying annealing temperatures and film thicknesses. This work demonstrates a simple yet effective method for fabricating high-efficiency CuO photocathodes.

Authors with CRIS profile

Hyesung Kim Lehrstuhl für Werkstoffwissenschaften (Korrosion und Oberflächentechnik) (LKO) Patrik Schmuki Lehrstuhl für Werkstoffwissenschaften (Korrosion und Oberflächentechnik) (LKO)

How to cite

APA:

Kim, H., & Schmuki, P. (2025). Direct current sputter deposited CuO layers on conductive glass: Towards a maximum photoelectrochemical response of photocathodes. Thin Solid Films, 816. https://doi.org/10.1016/j.tsf.2025.140655

MLA:

Kim, Hyesung, and Patrik Schmuki. "Direct current sputter deposited CuO layers on conductive glass: Towards a maximum photoelectrochemical response of photocathodes." Thin Solid Films 816 (2025).

BibTeX: Download