Processing and editing of faces using a measurement-based skin reflectance model

Weyrich T (2006)

Publication Language: English

Publication Type: Conference contribution, Original article

Publication year: 2006

Publisher: ACM

City/Town: New York, NY, USA

Pages Range: 168--168

Conference Proceedings Title: SIGGRAPH '06: ACM SIGGRAPH 2006 Sketches

Event location: Boston, Massachusetts US

ISBN: 1-59593-364-6

DOI: 10.1145/1179849.1180059

Authors with CRIS profile

Tim Weyrich Lehrstuhl für Informatik 15 (Digital Reality)

How to cite

APA:

Weyrich, T. (2006). Processing and editing of faces using a measurement-based skin reflectance model. In SIGGRAPH '06: ACM SIGGRAPH 2006 Sketches (pp. 168--168). Boston, Massachusetts, US: New York, NY, USA: ACM.

MLA:

Weyrich, Tim. "Processing and editing of faces using a measurement-based skin reflectance model." Proceedings of the ACM SIGGRAPH 2006: Sketches, Boston, Massachusetts New York, NY, USA: ACM, 2006. 168--168.

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