Pfeiffer K, Schulz U, Tunnermann A, Szeghalmi A (2017)
Publication Type: Conference contribution
Publication year: 2017
Publisher: SPIE
Book Volume: 10115
Conference Proceedings Title: Proceedings of SPIE - The International Society for Optical Engineering
Event location: San Francisco, CA, USA
ISBN: 9781510606715
DOI: 10.1117/12.2250272
Antireflective coatings are essential to improve transmittance of optical elements. Most research and development of AR coatings has been reported on a wide variety of plane optical surfaces; however, antireflection is also necessary on nonplanar optical surfaces. Physical vapor deposition (PVD), a common method for optical coatings, often results in thickness gradients on strongly curved surfaces, leading to a failure of the desired optical function. In this work, optical thin films of tantalum pentoxide, aluminum oxide and silicon dioxide were prepared by atomic layer deposition (ALD), which is based on self-limiting surface reactions. The results demonstrate that ALD optical layers can be deposited on both vertical and horizontal substrate surfaces with uniform thicknesses and the same optical properties. A Ta
APA:
Pfeiffer, K., Schulz, U., Tunnermann, A., & Szeghalmi, A. (2017). Ta2O5/ Al2O3/ SiO2 - antireflective coating for non-planar optical surfaces by atomic layer deposition. In Winston V. Schoenfeld, Georg von Freymann, Raymond C. Rumpf (Eds.), Proceedings of SPIE - The International Society for Optical Engineering. San Francisco, CA, USA: SPIE.
MLA:
Pfeiffer, K., et al. "Ta2O5/ Al2O3/ SiO2 - antireflective coating for non-planar optical surfaces by atomic layer deposition." Proceedings of the Advanced Fabrication Technologies for Micro/Nano Optics and Photonics X 2017, San Francisco, CA, USA Ed. Winston V. Schoenfeld, Georg von Freymann, Raymond C. Rumpf, SPIE, 2017.
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