Aberration correction for hard x-ray focusing at the nanoscale
Seiboth F, Schropp A, Scholz M, Wittwer F, Roedel C, Wuensche M, Ullsperger T, Nolte S, Rahomaeki J, Parfeniukas K, Giakoumidis S, Vogt U, Wagner U, Rau C, Boesenberg U, Garrevoet J, Falkenberg G, Galtier EC, Lee HJ, Nagler B, Schroer CG (2017)
Publication Type: Conference contribution
Publication year: 2017
Journal
Publisher: SPIE
Book Volume: 10386
Conference Proceedings Title: Proceedings of SPIE - The International Society for Optical Engineering
Event location: San Diego, CA, USA
ISBN: 9781510612297
DOI: 10.1117/12.2274030
Abstract
We developed a corrective phase plate that enables the correction of residual aberration in reflective, diffractive, and refractive X-ray optics. The principle is demonstrated on a stack of beryllium compound refractive lenses with a numerical aperture of 0.49 10-3 at three synchrotron radiation and x-ray free-electron laser facilities, where we corrected spherical aberration of the optical system. The phase plate improved the Strehl ratio of the optics from 0.29(7) to 0.87(5), creating a diffraction-limited, large aperture, nanofocusing optics that is radiation resistant and very compact.
Involved external institutions
Deutsches Elektronen-Synchrotron DESY
Germany (DE)
Stanford National Accelerator Laboratory (SLAC)
United States (USA) (US)
Friedrich-Schiller-Universität Jena
Germany (DE)
Royal Institute of Technology / Kungliga Tekniska Högskolan (KTH)
Sweden (SE)
Diamond Light Source
United Kingdom (GB)
Germany (DE)
Stanford National Accelerator Laboratory (SLAC)
United States (USA) (US)
Friedrich-Schiller-Universität Jena
Germany (DE)
Royal Institute of Technology / Kungliga Tekniska Högskolan (KTH)
Sweden (SE)
Diamond Light Source
United Kingdom (GB)
How to cite
APA:
Seiboth, F., Schropp, A., Scholz, M., Wittwer, F., Roedel, C., Wuensche, M.,... Schroer, C.G. (2017). Aberration correction for hard x-ray focusing at the nanoscale. In Christian Morawe, Ali M. Khounsary, Shunji Goto (Eds.), Proceedings of SPIE - The International Society for Optical Engineering. San Diego, CA, USA: SPIE.
MLA:
Seiboth, Frank, et al. "Aberration correction for hard x-ray focusing at the nanoscale." Proceedings of the Advances in X-Ray/EUV Optics and Components XII 2017, San Diego, CA, USA Ed. Christian Morawe, Ali M. Khounsary, Shunji Goto, SPIE, 2017.
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