Beladiya V, Becker M, Faraz T, Kessels WMM, Schenk P, Otto F, Fritz T, Gruenewald M, Helbing C, Jandt KD, Tuennermann A, Sierka M, Szeghalmi A (2020)
Publication Type: Journal article
Publication year: 2020
Book Volume: 12
Pages Range: 2089-2102
Journal Issue: 3
DOI: 10.1039/c9nr07202k
The growth, chemical, structural, mechanical, and optical properties of oxide thin films deposited by plasma enhanced atomic layer deposition (PEALD) are strongly influenced by the average-bias voltage applied during the reaction step of surface functional groups with oxygen plasma species. Here, this effect is investigated thoroughly for SiO
APA:
Beladiya, V., Becker, M., Faraz, T., Kessels, W.M.M., Schenk, P., Otto, F.,... Szeghalmi, A. (2020). Effect of an electric field during the deposition of silicon dioxide thin films by plasma enhanced atomic layer deposition: An experimental and computational study. Nanoscale, 12(3), 2089-2102. https://doi.org/10.1039/c9nr07202k
MLA:
Beladiya, Vivek, et al. "Effect of an electric field during the deposition of silicon dioxide thin films by plasma enhanced atomic layer deposition: An experimental and computational study." Nanoscale 12.3 (2020): 2089-2102.
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