Material-specific ptychographic imaging at 13.5 nm using a high-order harmonic source
Eschen W, Loetgering L, Schuster V, Klas R, Kirsche A, Berthold L, Steinert M, Pertsch T, Gross H, Krause M, Limpert J, Rothhardt J (2022)
Publication Type: Conference contribution
Publication year: 2022
Publisher: Optica Publishing Group (formerly OSA)
Conference Proceedings Title: Optics InfoBase Conference Papers
Event location: Budapest, HUN
ISBN: 9781957171067
Abstract
We present a high-harmonic driven ptychographic EUV microscope operating at a wavelength of 13.5 nm. Sub-20 nm resolution is demonstrated and the accurate amplitude and phase images are harnessed to identify multiple materials of an integrated circuit.
Involved external institutions
Friedrich-Schiller-Universität Jena
Germany (DE)
Fraunhofer-Institut für Mikrostruktur von Werkstoffen und Systemen IMWS
Germany (DE)
Germany (DE)
Fraunhofer-Institut für Mikrostruktur von Werkstoffen und Systemen IMWS
Germany (DE)
How to cite
APA:
Eschen, W., Loetgering, L., Schuster, V., Klas, R., Kirsche, A., Berthold, L.,... Rothhardt, J. (2022). Material-specific ptychographic imaging at 13.5 nm using a high-order harmonic source. In Optics InfoBase Conference Papers. Budapest, HUN: Optica Publishing Group (formerly OSA).
MLA:
Eschen, Wilhelm, et al. "Material-specific ptychographic imaging at 13.5 nm using a high-order harmonic source." Proceedings of the Compact EUV and X-ray Light Sources, EUVXRAY 2022, Budapest, HUN Optica Publishing Group (formerly OSA), 2022.
BibTeX: Download