Plasma treatments and photonic nanostructures for shallow nitrogen vacancy centers in diamond

Radtke M, Render L, Nelz R, Neu E (2019)

Publication Type: Journal article

Publication year: 2019

Journal

Optical Materials Express Optical Society of America

Book Volume: 9

Pages Range: 4716-4733

Journal Issue: 12

DOI: 10.1364/OME.9.004716

Abstract

We investigate the influence of plasma treatments, especially a 0V-bias, potentially low damage O2 plasma as well as a biased Ar/SF6/O2 plasma on shallow, negative nitrogen vacancy (NV^-) centers. We ignite and sustain our 0V-bias plasma using purely inductive coupling. To this end, we pre-treat surfaces of high purity chemical vapor deposited single-crystal diamond (SCD). Subsequently, we create ~10 nm deep NV^- centers via implantation and annealing. Onto the annealed SCD surface, we fabricate nanopillar structures that efficiently waveguide the photoluminescence (PL) of shallow NV^-. Characterizing single NV^- inside these nanopillars, we find that the Ar/SF6/O2 plasma treatment quenches NV^- PL even considering that the annealing and cleaning steps following ion implantation remove any surface termination. In contrast, for our 0V-bias as well as biased O2 plasma, we observe stable NV^- PL and low background fluorescence from the photonic nanostructures.

Involved external institutions

Universität des Saarlandes (UdS)

Germany (DE)

How to cite

APA:

Radtke, M., Render, L., Nelz, R., & Neu, E. (2019). Plasma treatments and photonic nanostructures for shallow nitrogen vacancy centers in diamond. Optical Materials Express, 9(12), 4716-4733. https://dx.doi.org/10.1364/OME.9.004716

MLA:

Radtke, Mariusz, et al. "Plasma treatments and photonic nanostructures for shallow nitrogen vacancy centers in diamond." Optical Materials Express 9.12 (2019): 4716-4733.

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