Nanostructured films of block copolymers functionalized with photolabile protected amino groups

Stadermann J, Riedel M, Voit B (2013)

Publication Type: Journal article

Publication year: 2013

Journal

Macromolecular Chemistry and Physics Wiley-VCH Verlag

Book Volume: 214

Pages Range: 263-271

Journal Issue: 2

DOI: 10.1002/macp.201200409

Abstract

Two phase separating block copolymers with photolabile protected amino groups in one block have been synthesized through RAFT polymerization followed by efficient click modification. Techniques like NMR, GPC, and DSC were applied for the characterization of these functional materials. The block copolymers were used for the preparation of thin films where they assemble to form distinct nanostructures as detected by AFM analysis. © 2013 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

Involved external institutions

Leibniz-Institut für Polymerforschung Dresden e. V. DE Germany (DE)

How to cite

APA:

Stadermann, J., Riedel, M., & Voit, B. (2013). Nanostructured films of block copolymers functionalized with photolabile protected amino groups. Macromolecular Chemistry and Physics, 214(2), 263-271. https://dx.doi.org/10.1002/macp.201200409

MLA:

Stadermann, Jan, Maria Riedel, and Brigitte Voit. "Nanostructured films of block copolymers functionalized with photolabile protected amino groups." Macromolecular Chemistry and Physics 214.2 (2013): 263-271.

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