Nanoimprint Lithography for Photovoltaic Applications
Schumm B, Kaskel S (2013)
Publication Type: Authored book
Publication year: 2013
Publisher: Wiley Blackwell
ISBN: 9781118845721
DOI: 10.1002/9781118845721.ch7
Abstract
Nanoimprint lithography has recently attracted considerable interest as a low-cost and high-throughput tool for nanofabrication in photovoltaic cell processing. While nanoimprint lithography offers a cheap and simple alternative to conventional lithography techniques on the one hand, it can also be used for large-scale roll-to-roll processes. These aspects enable the technique to be applied in solar cell processing steps. Nanostructured antirefl ection layers on the substrate or wafer outside can be produced with photocurable polymers. Acting as etch masks layers patterned by nanoimprint lithography can be used to generate a large variety of three-dimensional surface reliefs. By patterning the inside of thin-fi lm solar cell substrates light-trapping effects can be generated. Light-trapping can also be achieved by the preparation of plasmonically active metal layers. After an introduction of the nanoimprint lithography technique, different applications in solar cell manufacturing are presented in this chapter.
Involved external institutions
Germany (DE)How to cite
APA:
Schumm, B., & Kaskel, S. (2013). Nanoimprint Lithography for Photovoltaic Applications. Wiley Blackwell.
MLA:
Schumm, Benjamin, and Stefan Kaskel. Nanoimprint Lithography for Photovoltaic Applications. Wiley Blackwell, 2013.
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