Bottom-Up Fabrication of Sulfur-Doped Graphene Films Derived from Sulfur-Annulated Nanographene for Ultrahigh Volumetric Capacitance Micro-Supercapacitors
Wu ZS, Tan YZ, Zheng S, Wang S, Parvez K, Qin J, Shi X, Sun C, Bao X, Feng X, Muellen K (2017)
Publication Type: Journal article
Publication year: 2017
Journal
Book Volume: 139
Pages Range: 4506-4512
Journal Issue: 12
DOI: 10.1021/jacs.7b00805
Abstract
Heteroatom doping of nanocarbon films can efficiently boost the pseudocapacitance of micro-supercapacitors (MSCs); however, wafer-scale fabrication of sulfur-doped graphene films with a tailored thickness and homogeneous doping for MSCs remains a great challenge. Here we demonstrate the bottom-up fabrication of continuous, uniform, and ultrathin sulfur-doped graphene (SG) films, derived from the peripherical trisulfur-annulated hexa-peri-hexabenzocoronene (SHBC), for ultrahigh-rate MSCs (SG-MSCs) with landmark volumetric capacitance. The SG film was prepared by thermal annealing of the spray-coated SHBC-based film, with assistance of a thin Au protecting layer, at 800 °C for 30 min. SHBC with 12 phenylthio groups decorated at the periphery is critical as a precursor for the formation of the continuous and ultrathin SG film, with a uniform thickness of 10.0 nm. Notably, the as-produced all-solid-state planar SG-MSCs exhibited a highly stable pseudocapacitive behavior with a volumetric capacitance of 582 F cm-3 at 10 mV s-1, excellent rate capability with a remarkable capacitance of 8.1 F cm-3 even at an ultrahigh rate of 2000 V s-1, ultrafast frequency response with a short time constant of 0.26 ms, and ultrahigh power density of 1191 W cm-3. It is noteworthy that these values obtained are among the best values for carbon-based MSCs reported to date.
Involved external institutions
Chinese Academy of Sciences (CAS) / 中国科学院
China (CN)
Xiamen University
China (CN)
University of Manchester
United Kingdom (GB)
Technische Universität Dresden
Germany (DE)
Max-Planck-Institut für Polymerforschung (MPI-P) / Max Planck Institute for Polymer Research
Germany (DE)
China (CN)
Xiamen University
China (CN)
University of Manchester
United Kingdom (GB)
Technische Universität Dresden
Germany (DE)
Max-Planck-Institut für Polymerforschung (MPI-P) / Max Planck Institute for Polymer Research
Germany (DE)
How to cite
APA:
Wu, Z.-S., Tan, Y.-Z., Zheng, S., Wang, S., Parvez, K., Qin, J.,... Muellen, K. (2017). Bottom-Up Fabrication of Sulfur-Doped Graphene Films Derived from Sulfur-Annulated Nanographene for Ultrahigh Volumetric Capacitance Micro-Supercapacitors. Journal of the American Chemical Society, 139(12), 4506-4512. https://doi.org/10.1021/jacs.7b00805
MLA:
Wu, Zhong-Shuai, et al. "Bottom-Up Fabrication of Sulfur-Doped Graphene Films Derived from Sulfur-Annulated Nanographene for Ultrahigh Volumetric Capacitance Micro-Supercapacitors." Journal of the American Chemical Society 139.12 (2017): 4506-4512.
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