X-ray beam monitoring and source position stabilization at an inverse-Compton X-ray source
Gu¨nther B, Dierolf M, Achterhold K, Pfeiffer F (2018)
Publication Type: Conference contribution
Publication year: 2018
Publisher: OSA - The Optical Society
Book Volume: Part F85-EUVXRAY 2018
Conference Proceedings Title: Optics InfoBase Conference Papers
Event location: Strasbourg, FRA
ISBN: 9781557528209
DOI: 10.1364/EUVXRAY.2018.EM2B.5
Abstract
Overlap between laser- and electron beam determines flux at inverse-Compton X-ray sources. Beam drifts deteriorate flux and source position. A closed-loop feedback system counteracting this movement was developed to stabilize source position.
Involved external institutions
Germany (DE)How to cite
APA:
Gu¨nther, B., Dierolf, M., Achterhold, K., & Pfeiffer, F. (2018). X-ray beam monitoring and source position stabilization at an inverse-Compton X-ray source. In Optics InfoBase Conference Papers. Strasbourg, FRA: OSA - The Optical Society.
MLA:
Gu¨nther, Benedikt, et al. "X-ray beam monitoring and source position stabilization at an inverse-Compton X-ray source." Proceedings of the Compact EUV and X-ray Light Sources, EUVXRAY 2018, Strasbourg, FRA OSA - The Optical Society, 2018.
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