Fabrication of X-ray absorption gratings by centrifugal deposition of bimodal tungsten particles in high aspect ratio silicon templates

Pinzek S, Gustschin A, Gustschin N, Viermetz M, Pfeiffer F (2022)


Publication Type: Journal article

Publication year: 2022

Journal

Book Volume: 12

Article Number: 5405

Journal Issue: 1

DOI: 10.1038/s41598-022-08222-z

Abstract

Grating-based X-ray imaging employs high aspect ratio absorption gratings to generate contrast induced by attenuating, phase-shifting, and small-angle scattering properties of the imaged object. The fabrication of the absorption gratings remains a crucial challenge of the method on its pathway to clinical applications. We explore a simple and fast centrifugal tungsten particle deposition process into silicon-etched grating templates, which has decisive advantages over conventional methods. For that, we use a bimodal tungsten particle suspension which is introduced into a custom designed grating holder and centrifuged at over 1000×g. Gratings with 45 µm period, 450 µm depth, and 170 mm × 38 mm active area are successfully processed reaching a homogeneous absorber filling. The effective absorbing tungsten thickness in the trenches is 207 µm resulting in a filling ratio of 46.6% compared to a voidless filling. The grating was tested in a Talbot–Lau interferometer designed for clinical X-ray dark-field computed tomography, where visibilities up to 33.6% at 60 kV were achieved.

Involved external institutions

How to cite

APA:

Pinzek, S., Gustschin, A., Gustschin, N., Viermetz, M., & Pfeiffer, F. (2022). Fabrication of X-ray absorption gratings by centrifugal deposition of bimodal tungsten particles in high aspect ratio silicon templates. Scientific Reports, 12(1). https://doi.org/10.1038/s41598-022-08222-z

MLA:

Pinzek, Simon, et al. "Fabrication of X-ray absorption gratings by centrifugal deposition of bimodal tungsten particles in high aspect ratio silicon templates." Scientific Reports 12.1 (2022).

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