Monaico E, Monaico EI, Ursaki VV, Tiginyanu IM, Nielsch K (2019)
Publication Type: Journal article
Publication year: 2019
Book Volume: 55
Pages Range: 367-372
Journal Issue: 4
DOI: 10.3103/S1068375519040070
Abstract –: We report on the application of specially-designed masks for the purpose of electrochemical etching of InP single crystals which enables one to change in a controlled fashion the direction of propagation of pores, including those propagating in directions parallel to the top surface of substrates. The fabricated templates have been used to electrochemically deposit metallic nanostructures along predefined directions and to develop two-dimensional arrays of metallic nanotubes or nanowires embedded in semiconductor matrices.
APA:
Monaico, E., Monaico, E.I., Ursaki, V.V., Tiginyanu, I.M., & Nielsch, K. (2019). Electrochemical Deposition by Design of Metal Nanostructures. Surface Engineering and Applied Electrochemistry, 55(4), 367-372. https://doi.org/10.3103/S1068375519040070
MLA:
Monaico, Ed., et al. "Electrochemical Deposition by Design of Metal Nanostructures." Surface Engineering and Applied Electrochemistry 55.4 (2019): 367-372.
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