Wiegand CW, Faust R, Meinhardt A, Blick RH, Zierold R, Nielsch K (2018)
Publication Type: Journal article
Publication year: 2018
Book Volume: 30
Pages Range: 1971-1979
Journal Issue: 6
DOI: 10.1021/acs.chemmater.7b05128
In atomic layer deposition (ALD), the initial growth is of particular interest because it defines the nucleation behavior and determines the minimum number of cycles to achieve a closed layer. The growth rate is quantified by the growth per cycle (GPC). Due to nucleation inhibition or enhancement, the initial GPC for ALD processes of a given material system onto a specific substrate may differ from its (steady-state) literature value because the GPC is mostly noted as an average value of at least a few hundred cycles. However, the knowledge of the growth behavior within the first few cycles is of particular importance in context of super cycles and nanolaminates. Individual ALD cycles of the host material (e.g., TiO
APA:
Wiegand, C.W., Faust, R., Meinhardt, A., Blick, R.H., Zierold, R., & Nielsch, K. (2018). Understanding the Growth Mechanisms of Multilayered Systems in Atomic Layer Deposition Process. Chemistry of Materials, 30(6), 1971-1979. https://doi.org/10.1021/acs.chemmater.7b05128
MLA:
Wiegand, Christoph W., et al. "Understanding the Growth Mechanisms of Multilayered Systems in Atomic Layer Deposition Process." Chemistry of Materials 30.6 (2018): 1971-1979.
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