Air-Oxidation of Nb Nano-Films
Lubenchenko AV, Batrakov AA, Ivanov DA, Lubenchenko OI, Lashkov IA, Pavolotsky AB, Schleicher B, Albert N, Nielsch K (2018)
Publication Type: Journal article
Publication year: 2018
Journal
Book Volume: 52
Pages Range: 678-682
Journal Issue: 5
DOI: 10.1134/S1063782618050196
Abstract
X-ray photoelectron spectroscopy (XPS) depth chemical and phase profiling of air-oxidized niobium nanofilms has been performed. It is found that oxide layer thicknesses depend on the initial thickness of the niobium nanofilm. The increase in thickness of the initial Nb nano-layer is due to increase in thickness of an oxidized layer.
Involved external institutions
National Research University Moscow Power Engineering Institute - MPEI
Russian Federation (RU)
Chalmers University of Technology / Chalmers tekniska högskola
Sweden (SE)
Leibniz-Institut für Festkörper- und Werkstoffforschung Dresden e.V. (IFW) / Leibniz Institute for Solid State and Materials Research Dresden
Germany (DE)
Russian Federation (RU)
Chalmers University of Technology / Chalmers tekniska högskola
Sweden (SE)
Leibniz-Institut für Festkörper- und Werkstoffforschung Dresden e.V. (IFW) / Leibniz Institute for Solid State and Materials Research Dresden
Germany (DE)
How to cite
APA:
Lubenchenko, A.V., Batrakov, A.A., Ivanov, D.A., Lubenchenko, O.I., Lashkov, I.A., Pavolotsky, A.B.,... Nielsch, K. (2018). Air-Oxidation of Nb Nano-Films. Semiconductors, 52(5), 678-682. https://doi.org/10.1134/S1063782618050196
MLA:
Lubenchenko, A. V., et al. "Air-Oxidation of Nb Nano-Films." Semiconductors 52.5 (2018): 678-682.
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