Nanoimprint lithography of nanoporous carbon materials for micro-supercapacitor architectures

Lochmann S, Grothe J, Eckhardt K, Leistenschneider D, Borchardt L, Kaskel S (2018)


Publication Type: Journal article

Publication year: 2018

Journal

Book Volume: 10

Pages Range: 10109-10115

Journal Issue: 21

DOI: 10.1039/c8nr01535j

Abstract

Nanoimprint lithography is proposed as a highly versatile method for the production of nanostructured supercapacitors (micro-supercapacitors, MSC). Liquid sucrose- and lignin-precursor printing produces patterns with high quality and a line width down to 500 nm. The liquid-carbon-precursor NIL-printing approach enables nitrogen doping to achieve an increased supercapacitor performance for aqueous electrolytes (Li2SO4). The lines are interconverted into nanoporous carbon materials (d ≈ 1 nm) with high specific surface area (>1000 m2 g-1) to form stable structures reaching specific resistivities as low as ρ = 3.5 × 10-5 Ωm and capacitances up to 7 F cm-3.

Involved external institutions

How to cite

APA:

Lochmann, S., Grothe, J., Eckhardt, K., Leistenschneider, D., Borchardt, L., & Kaskel, S. (2018). Nanoimprint lithography of nanoporous carbon materials for micro-supercapacitor architectures. Nanoscale, 10(21), 10109-10115. https://doi.org/10.1039/c8nr01535j

MLA:

Lochmann, Stefanie, et al. "Nanoimprint lithography of nanoporous carbon materials for micro-supercapacitor architectures." Nanoscale 10.21 (2018): 10109-10115.

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