Reflectivity of VUV-sensitive silicon photomultipliers in liquid Xenon

Wagenpfeil M, Ziegler T, Schneider J, Fieguth A, Murra M, Schulte D, Althueser L, Huhmann C, Weinheimer C, Michel T, Anton G, Adhikari G, Al kharusi S, Angelico E, Arnquist IJ, Badhrees I, Bane J, Beck D, Belov V, Bhatta T, Bolotnikov A, Breur PA, Brodsky JP, Brown E, Brunner T, Caden E, Cao GF, Chambers C, Chana B, Charlebois SA, Chernyak D, Chiu M, Cleveland B, Craycraft A, Daniels T, Darroch L, Der mesrobian-Kabakian A, De A, Deslandes K, Devoe R, Di vacri ML, Dolinski MJ, Echevers J, Elbeltagi M, Fabris L, Fairbank D, Fairbank W, Farine J, Ferrara S, Feyzbakhsh S, Gallina G, Gautam P, Giacomini G, Gingras C, Goeldi D, Gorham A, Gornea R, Gratta G, Hansen EV, Hardy CA, Harouaka K, Heffner M, Hoppe EW, House A, Hughes M, Iverson A, Jamil A, Jewell M, Karelin A, Kaufman LJ, Krücken R, Kuchenkov A, Kumar KS, Lan Y, Larson A, Leach KG, Leonard DS, Li G, Li S, Li Z, Licciardi C, Lindsay R, Maclellan R, Martel-Dion P, Massacret N, Mcelroy T, Medina peregrina M, Mong B, Moore DC, Murray K, Nattress J, Natzke CR, Newby RJ, Nolet F, Nusair O, Nzobadila ondze JC, Odgers K, Odian A, Orrell JL, Ortega GS, Ostrovskiy I, Overman CT, Parent S, Piepke A, Pocar A, Pratte JF, Raguzin E, Ramonnye GJ, Rasiwala H, Rescia S, Reti re F, Richard C, Richman M, Ringuette J, Robinson A, Rossignol T, Rowson PC, Roy N, Saldanha R, Sangiorgio S, Soma AK, Spadoni F, Stekhanov V, Stiegler T, Tarka M, Thibado S, Tidball A, Todd J, Totev T, Triambak S, Tsang R, Vachon F, Veeraraghavan V, Viel S, Vivo-Vilches C, Walent M, Wichoski U, Worcester M, Wu SX, Xia Q, Yan W, Yang L, Zeldovich O (2021)

Publication Type: Journal article

Publication year: 2021

Journal

Book Volume: 16

Article Number: P08002

Journal Issue: 8

DOI: 10.1088/1748-0221/16/08/P08002

Abstract

Silicon photomultipliers are regarded as a very promising technology for next-generation, cutting-edge detectors for low-background experiments in particle physics. This work presents systematic reflectivity studies of Silicon Photomultipliers (SiPM) and other samples in liquid xenon at vacuum ultraviolet (VUV) wavelengths. A dedicated setup at the University of Münster has been used that allows to acquire angle-resolved reflection measurements of various samples immersed in liquid xenon with 0.45 angular resolution. Four samples are investigated in this work: one Hamamatsu VUV4 SiPM, one FBK VUV-HD SiPM, one FBK wafer sample and one Large-Area Avalanche Photodiode (LA-APD) from EXO-200. The reflectivity is determined to be 25-36 % at an angle of incidence of 20 for the four samples and increases to up to 65 % at 70 for the LA-APD and the FBK samples. The Hamamatsu VUV4 SiPM shows a decline with increasing angle of incidence. The reflectivity results will be incorporated in upcoming light response simulations of the nEXO detector.

Authors with CRIS profile

Involved external institutions

McGill University Canada (CA) Brookhaven National Laboratory United States (USA) (US) Yale University United States (USA) (US) Université de Sherbrooke Canada (CA) Westfälische Wilhelms-Universität (WWU) Münster Germany (DE) University of California, San Diego (UC San Diego, UCSD) United States (USA) (US) Stanford University United States (USA) (US) The University of Alabama United States (USA) (US) Colorado State University United States (USA) (US) University of North Carolina Wilmington (UNCW) United States (USA) (US) Stanford National Accelerator Laboratory (SLAC) United States (USA) (US) Pacific Northwest National Laboratory United States (USA) (US) University of Illinois at Urbana-Champaign United States (USA) (US) Laurentian University Canada (CA) Lawrence Livermore National Laboratory United States (USA) (US) Institute of High Energy Physics (IHEP) / 中国科学院高能物理研究所 China (CN) Institute for Theoretical and Experimental Physics (ITEP) /Институт теоретической и экспериментальной физики Russian Federation (RU) Carleton University Canada (CA) University of Massachusetts Amherst (UMass) United States (USA) (US) University of British Columbia Canada (CA) Rensselaer Polytechnic Institute (RPI) United States (USA) (US) University of the Western Cape (UWC) South Africa (ZA) Oak Ridge National Laboratory United States (USA) (US) Drexel University United States (USA) (US) Triumf Canada (CA) University of Kentucky United States (USA) (US) Colorado School of Mines United States (USA) (US) University of South Dakota United States (USA) (US) Institute for Basic Science Korea, Republic of (KR)

How to cite

APA:

Wagenpfeil, M., Ziegler, T., Schneider, J., Fieguth, A., Murra, M., Schulte, D.,... Zeldovich, O. (2021). Reflectivity of VUV-sensitive silicon photomultipliers in liquid Xenon. Journal of Instrumentation, 16(8). https://doi.org/10.1088/1748-0221/16/08/P08002

MLA:

Wagenpfeil, Michael, et al. "Reflectivity of VUV-sensitive silicon photomultipliers in liquid Xenon." Journal of Instrumentation 16.8 (2021).

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