Schlipf J, Tetzner H, Spirito D, Manganelli CL, Capellini G, Huang MRS, Koch CT, Clausen CJ, Elsayed A, Oehme M, Chiussi S, Schulze J, Fischer IA (2021)
Publication Type: Journal article
Publication year: 2021
Book Volume: 52
Pages Range: 1167-1175
Journal Issue: 6
DOI: 10.1002/jrs.6098
We examine the Raman shift in silicon–germanium–tin alloys with high silicon content grown on a germanium virtual substrate by molecular beam epitaxy. The Raman shifts of the three most prominent modes, Si–Si, Si–Ge, and Ge–Ge, are measured and compared with results in previous literature. We analyze and fit the dependence of the three modes on the composition and strain of the semiconductor alloys. We also demonstrate the calculation of the composition and strain of Si
APA:
Schlipf, J., Tetzner, H., Spirito, D., Manganelli, C.L., Capellini, G., Huang, M.R.S.,... Fischer, I.A. (2021). Raman shifts in MBE-grown SixGex1 − − ySny alloys with large Si content. Journal of Raman Spectroscopy, 52(6), 1167-1175. https://doi.org/10.1002/jrs.6098
MLA:
Schlipf, Jon, et al. "Raman shifts in MBE-grown SixGex1 − − ySny alloys with large Si content." Journal of Raman Spectroscopy 52.6 (2021): 1167-1175.
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