Vollertsen F, Hofmann A (2000)
Publication Type: Conference contribution
Publication year: 2000
Publisher: IDDRG
Pages Range: 67-76
Conference Proceedings Title: Proceedings of the 20th Biennal IDDRG Congress
Event location: Genval
APA:
Vollertsen, F., & Hofmann, A. (2000). Modelling the deep drawing of process optimized blanks. In Proceedings of the 20th Biennal IDDRG Congress (pp. 67-76). Genval: IDDRG.
MLA:
Vollertsen, Frank, and Achim Hofmann. "Modelling the deep drawing of process optimized blanks." Proceedings of the Proceedings of the 20th Biennal IDDRG Congress, Genval IDDRG, 2000. 67-76.
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