Dirnecker T, Ruf A, Frey L, Beyer A, Bauer A, Henke D, Ryssel H (2002)
Publication Status: Published
Publication Type: Conference contribution, Conference Contribution
Publication year: 2002
Publisher: Institute of Electrical and Electronics Engineers Inc.
Pages Range: 106-109
Article Number: 1042620
ISBN: 0965157776
DOI: 10.1109/PPID.2002.1042620
APA:
Dirnecker, T., Ruf, A., Frey, L., Beyer, A., Bauer, A., Henke, D., & Ryssel, H. (2002). Influence of photoresist pattern on charging damage during high current ion implantation. In Proceedings of the 7th International Symposium on Plasma- and Process-Induced Damage, P2ID 2002 (pp. 106-109). Institute of Electrical and Electronics Engineers Inc..
MLA:
Dirnecker, Tobias, et al. "Influence of photoresist pattern on charging damage during high current ion implantation." Proceedings of the 7th International Symposium on Plasma- and Process-Induced Damage, P2ID 2002 Institute of Electrical and Electronics Engineers Inc., 2002. 106-109.
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