Gyulai J, Frey L, Ryssel H, Khanh N (1991)
Publication Status: Published
Publication Type: Journal article, Original article
Publication year: 1991
Book Volume: 6
Pages Range: 1695-1700
Journal Issue: 8
APA:
Gyulai, J., Frey, L., Ryssel, H., & Khanh, N. (1991). Effect of oxygen on the formation of end-of-range disorder in implantation amorphized silicon. Journal of Materials Research, 6(8), 1695-1700. https://doi.org/10.1557/JMR.1991.1695
MLA:
Gyulai, Jozsef, et al. "Effect of oxygen on the formation of end-of-range disorder in implantation amorphized silicon." Journal of Materials Research 6.8 (1991): 1695-1700.
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