Maier R, Haeublein V, Ryssel H, Völlm H, Feili D, Seidel H, Frey L (2012)
Publication Status: Published
Publication Type: Conference contribution, Conference Contribution
Publication year: 2012
Book Volume: 1496
Pages Range: 276-279
Event location: Valladolid
ISBN: 9780735411098
DOI: 10.1063/1.4766542
APA:
Maier, R., Haeublein, V., Ryssel, H., Völlm, H., Feili, D., Seidel, H., & Frey, L. (2012). Solid-phase epitaxy of silicon amorphized by implantation of the alkali elements rubidium and cesium. In Proceedings of the 19th International Conference on Ion Implantation Technology 2012, IIT 2012 (pp. 276-279). Valladolid.
MLA:
Maier, Reinhard, et al. "Solid-phase epitaxy of silicon amorphized by implantation of the alkali elements rubidium and cesium." Proceedings of the 19th International Conference on Ion Implantation Technology 2012, IIT 2012, Valladolid 2012. 276-279.
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