Rommel M, Rumler M, Haas A, Bauer AJ, Frey L (2013)
Publication Status: Published
Publication Type: Journal article, Original article
Publication year: 2013
Publisher: Elsevier B.V.
Book Volume: 110
Pages Range: 177-182
DOI: 10.1016/j.mee.2013.03.081
APA:
Rommel, M., Rumler, M., Haas, A., Bauer, A.J., & Frey, L. (2013). Processing of silicon nanostructures by Ga+ resistless lithography and reactive ion etching. Microelectronic Engineering, 110, 177-182. https://doi.org/10.1016/j.mee.2013.03.081
MLA:
Rommel, Mathias, et al. "Processing of silicon nanostructures by Ga+ resistless lithography and reactive ion etching." Microelectronic Engineering 110 (2013): 177-182.
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