Szwarc R, Frey L, Weber H, Moder I, Erlbacher T, Rommel M, Bauer AJ (2015)
Publication Status: Published
Publication Type: Conference contribution, Conference Contribution
Publication year: 2015
Publisher: Institute of Electrical and Electronics Engineers Inc.
Pages Range: 445-450
Article Number: 7164437
ISBN: 9781479999309
DOI: 10.1109/ASMC.2015.7164437
APA:
Szwarc, R., Frey, L., Weber, H., Moder, I., Erlbacher, T., Rommel, M., & Bauer, A.J. (2015). Modelling of the electrochemical etch stop with high reverse bias across pn-junctions. In Proceedings of the 26th Annual SEMI Advanced Semiconductor Manufacturing Conference, ASMC 2015 (pp. 445-450). Institute of Electrical and Electronics Engineers Inc..
MLA:
Szwarc, Robert, et al. "Modelling of the electrochemical etch stop with high reverse bias across pn-junctions." Proceedings of the 26th Annual SEMI Advanced Semiconductor Manufacturing Conference, ASMC 2015 Institute of Electrical and Electronics Engineers Inc., 2015. 445-450.
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