Fader R, Landwehr J, Rumler M, Rommel M, Bauer A, Frey L, Voelkel R, Brehm M, Kraft A (2013)
Publication Status: Published
Publication Type: Journal article, Original article
Publication year: 2013
Book Volume: 110
Pages Range: 90-93
DOI: 10.1016/j.mee.2013.02.030
This work presents a functional resist for the direct fabrication of micro-optical elements with UVenhanced substrate conformal imprint lithography (UV-SCIL). This functional resist is based on a UV-curable epoxy polymer where TiO nanoparticles are enclosed. Adding these particles to the polymer raises the refractive index of the functional resist with raising particle content from 1.52 up to 1.64 at a wavelength of 633 nm. Therefore, the refractive index can be matched for many micro-optical applications. Here, multilevel Fresnel lenses from a 200 mm silica substrate are transferred into the functional resist by UV-SCIL with nanometer resolution and high structure fidelity. © 2013 Elsevier B.V. All rights reserved.
APA:
Fader, R., Landwehr, J., Rumler, M., Rommel, M., Bauer, A., Frey, L.,... Kraft, A. (2013). Functional epoxy polymer for direct nano-imprinting of micro-optical elements. Microelectronic Engineering, 110, 90-93. https://doi.org/10.1016/j.mee.2013.02.030
MLA:
Fader, Robert, et al. "Functional epoxy polymer for direct nano-imprinting of micro-optical elements." Microelectronic Engineering 110 (2013): 90-93.
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