Influence of Antenna Shape and Resist Patterns on Charging Damage During Ion Implantation

Dirnecker T, Frey L, Bauer A, Ryssel H, Ruf A, Henke D, Beyer A (2003)

Publication Type: Conference contribution

Publication year: 2003

Publisher: IEEE

City/Town: Piscataway

Pages Range: 291-294

Conference Proceedings Title: IEEE Proc. on Ion Implantation Technology-2002

Event location: Taos, New Mexico, USA

ISBN: 0-7803-7155-0

DOI: 10.1109/IIT.2002.1257996

Authors with CRIS profile

Tobias Dirnecker Lehrstuhl für Elektronische Bauelemente Lothar Frey Lehrstuhl für Elektronische Bauelemente

Involved external institutions

Infineon Technologies Dresden GmbH & Co. KG DE Germany (DE)

How to cite

APA:

Dirnecker, T., Frey, L., Bauer, A., Ryssel, H., Ruf, A., Henke, D., & Beyer, A. (2003). Influence of Antenna Shape and Resist Patterns on Charging Damage During Ion Implantation. In IEEE Proc. on Ion Implantation Technology-2002 (pp. 291-294). Taos, New Mexico, USA: Piscataway: IEEE.

MLA:

Dirnecker, Tobias, et al. "Influence of Antenna Shape and Resist Patterns on Charging Damage During Ion Implantation." Proceedings of the Ion Implantation Technology, Taos, New Mexico, USA Piscataway: IEEE, 2003. 291-294.

BibTeX: Download