Rahimi Z, Erdmann A, Pflaum C (2009)
Publication Type: Conference contribution, Conference Contribution
Publication year: 2009
Pages Range: 809-812
Conference Proceedings Title: Proceedings of International Conference of "Electromagnetics in Advanced Applications", 2009. ICEAA '09
Event location: Turin
URI: http://ieeexplore.ieee.org/stamp/stamp.jsp?tp=&arnumber=5297317&isnumber=5297261
DOI: 10.1109/ICEAA.2009.5297317
APA:
Rahimi, Z., Erdmann, A., & Pflaum, C. (2009). Finite integration (FI) method for modelling optical waves in lithography masks. In Proceedings of International Conference of "Electromagnetics in Advanced Applications", 2009. ICEAA '09 (pp. 809-812). Turin.
MLA:
Rahimi, Zhabiz, Andreas Erdmann, and Christoph Pflaum. "Finite integration (FI) method for modelling optical waves in lithography masks." Proceedings of the ICEAA '09, Turin 2009. 809-812.
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