Pflaum C, Rahimi Z, Erdmann A (2010)
Publication Type: Conference contribution, Conference Contribution
Publication year: 2010
Edited Volumes: Proceedings of SPIE - The International Society for Optical Engineering
Book Volume: 7717
Pages Range: 771709-771709-12
Conference Proceedings Title: Optical Modelling and Design
Event location: Brüssel
ISBN: 9780819481900
URI: http://spie.org/x648.html?product_id=853726
DOI: 10.1117/12.853726
We present a finite integration technique (FIT) simulator for modelling light diffraction from lithographic masks with complex shapes. This method has high flexibility in geometrical modelling and treating curved boundaries. The inherent feature of FIT allows more accurate electromagnetic field simulation in complex structures. This technique is also suited for fast EMF simulations and large 3D problems because of its parallelisation potential. We applied this method to investigate the effect of complex mask shapes on the printed image. We demonstrate results for a phase-shift mask (PSM) with footing extensions and surface roughness. © 2010 SPIE.
APA:
Pflaum, C., Rahimi, Z., & Erdmann, A. (2010). Characterization of the scattering effect of complex mask geometries with surface roughness. In Optical Modelling and Design (pp. 771709-771709-12). Brüssel.
MLA:
Pflaum, Christoph, Zhabiz Rahimi, and Andreas Erdmann. "Characterization of the scattering effect of complex mask geometries with surface roughness." Proceedings of the SPIE Photonics Europe, Brüssel 2010. 771709-771709-12.
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