Low temperature decomposition of NO on ordered alumina films
Libuda J (2003)
Publication Type: Journal article
Publication year: 2003
Journal
Publisher: Elsevier
Book Volume: 381
Pages Range: 298-305
URI: http://www.sciencedirect.com/science?_ob=MImg&_imagekey=B6TFN-49V3JB6-2-B&_cdi=5231&_user=616145&_orig=search&_coverDate=11%2F14%2F2003&_sk=996189996&view=c&_alid=470052645&_rdoc=1&wchp=dGLbVzb-zSkzk&md5=e1ff0d01a79e521a55a39646c497284c&ie=/sdarticle.pdf
DOI: 10.1016/j.cplett.2003.09.101
Abstract
We have investigated the interaction of NO with an ordered Al 2O3 film and a Pd/Al2O3 supported model catalyst, employing time-resolved IR reflection absorption spectroscopy (TR-IRAS) and molecular beam methods. It is observed that NO undergoes slow decomposition at low sample temperature, resulting in the formation of variety of NxOy surface species. The process involves strong structural transformations of the Al2O3 film. On Pd/Al2O3, decomposition of NO is found to be strongly suppressed. Based on the growth behavior of Pd nucleating at oxide defects, it is concluded that NO decomposition is preferentially initiated at specific defect sites on the alumina. © 2003 Elsevier B.V. All rights reserved.
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How to cite
APA:
Libuda, J. (2003). Low temperature decomposition of NO on ordered alumina films. Chemical Physics Letters, 381, 298-305. https://doi.org/10.1016/j.cplett.2003.09.101
MLA:
Libuda, Jörg. "Low temperature decomposition of NO on ordered alumina films." Chemical Physics Letters 381 (2003): 298-305.
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