Motzek K, Bich A, Erdmann A, Hornung M, Hennemeyer M, Meliorisz PB, Hofmann U, Ünal N, Voelkel R, Partel S, Hudek P (2009)
Publication Type: Conference contribution
Publication year: 2009
Pages Range: ?
Conference Proceedings Title: Micro- and Nano-Engineering
Event location: Ghent, Belgium
DOI: 10.1016/j.mee.2009.10.038
APA:
Motzek, K., Bich, A., Erdmann, A., Hornung, M., Hennemeyer, M., Meliorisz, P.-B.,... Hudek, P. (2009). Optimization of illumination pupils and mask features for proximity printing. In Micro- and Nano-Engineering (pp. ?). Ghent, Belgium.
MLA:
Motzek, K., et al. "Optimization of illumination pupils and mask features for proximity printing." Proceedings of the Micro- and Nano-Engineering, Ghent, Belgium 2009. ?.
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