Low-Loss BAW Filters on High Resistivity Silicon for Mobile Radio

Hagelauer AM, Bader B, Henn G, Schaeufele A, Marksteiner S, Wagner KC, Weigel R (2009)


Publication Type: Conference contribution

Publication year: 2009

Pages Range: 337-340

Conference Proceedings Title: International Microwave Symposium

Event location: Boston, USA

ISBN: 978-1-4244-2803-8

DOI: 10.1109/MWSYM.2009.5165702

Abstract

Integration of bulk acoustic wave (BAW) filters into W-CDMA mobile communication applications is of high interest, as the BAW technology allows for low-loss and high Q signal forming in these 2 GHz devices. During the design phase of low- loss BAW filters it is very important that we not only control the most major loss mechanisms, like metal conductivity and viscosity of piezo material. We also have to focus the less well known losses. In this paper, we describe an interface loss effect which appears between the Si substrate and the first SiO2 layer of the BAW structure. Its influence on the filter characteristics of our 2 GHz filter is shown. This loss effect is caused by channel currents, which are induced by static charges (similar in FET transistors). For investigating the loss and its impact on the filter performance, we designed test structures and filters, performed and analyzed measurements, and adapted the loss model in our filter simulations accordingly.

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How to cite

APA:

Hagelauer, A.M., Bader, B., Henn, G., Schaeufele, A., Marksteiner, S., Wagner, K.C., & Weigel, R. (2009). Low-Loss BAW Filters on High Resistivity Silicon for Mobile Radio. In International Microwave Symposium (pp. 337-340). Boston, USA.

MLA:

Hagelauer, Amelie Marietta, et al. "Low-Loss BAW Filters on High Resistivity Silicon for Mobile Radio." Proceedings of the International Microwave Symposium, Boston, USA 2009. 337-340.

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