Photoelectron diffraction and holography of clean and sulphur-covered Ni(110)
Zharnikov M, Mehl D, Weinelt M, Zebisch P, Steinrück HP (1994)
Publication Type: Journal article
Publication year: 1994
Journal
Original Authors: Zharnikov M., Mehl D., Weinelt M., Zebisch P., Steinrück H.-P.
Publisher: Elsevier
Book Volume: 306
Pages Range: 125-143
DOI: 10.1016/0039-6028(94)91192-4
Abstract
We have measured angular distributions of Ni3p photoelectrons for clean Ni(110), and Ni3p as well as S2p and S2p photoelectrons for c(2 × 2)S on Ni(110) at kinetic energies below 300 eV. From the various photoelectron diffraction patterns ( = holograms) we have reconstructed real-space images using the formalism introduced by Barton and applying a Fourier filtering technique. For the clean surface, neighboring atoms in the plane of the emitter can be identified up to the fourth coordinate sphere. The maxima in the reconstructed image show deviations from the correct positions on the order of the expected resolution. In the plane above the emitter, intense artifacts are observed in the reconstructed images in addition to maxima at or close to the correct atomic positions, which hinders an unequivocal identification of substrate atoms in that spatial region. For c(2 × 2) S Ni(110) we are able to verify from the reconstructed images the fourfold hollow adsorption site of sulphur, with the distance above the first Ni layer of about 0.9 Å. The details of the reconstructed real-space images show some differences when using the S2p or S2p photoelectrons. From the reconstructed image in the plane of the emitter (adsorbate plane) an unequivocal identification of the neighboring S atoms in the c(2 × 2) layer is obscured by intense artifacts. © 1994.
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APA:
Zharnikov, M., Mehl, D., Weinelt, M., Zebisch, P., & Steinrück, H.-P. (1994). Photoelectron diffraction and holography of clean and sulphur-covered Ni(110). Surface Science, 306, 125-143. https://doi.org/10.1016/0039-6028(94)91192-4
MLA:
Zharnikov, M., et al. "Photoelectron diffraction and holography of clean and sulphur-covered Ni(110)." Surface Science 306 (1994): 125-143.
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