Krupke R, Malik S, Weber HB, Hampe O, Kappes M, von Löhneysen H (2002)
Publication Status: Published
Publication Type: Journal article
Publication year: 2002
Publisher: AMER CHEMICAL SOC
Book Volume: 2
Pages Range: 1161-1164
Journal Issue: 10
DOI: 10.1021/nl025679e
We show that a trimethylsilyl (TMS) self-assembled monolayer on a silicon surface is a self-developing positive resist, which can be patterned with low energy electrons. Contact angle measurements have been used to quantify the efficiency of the exposure as a function of exposure dose and acceleration voltage. Ash formation was negligible, as a 3-aminopropyltriethoxysilane (APTES) self-assembled monolayer could be formed on the patterned area without an intermediate development stage. APTES/TMS patterns have been visualized with scanning electron microscopy at low energy and atomic force microscopy. The functionality of the patterns has been tested by selective deposition of carbon nanotubes.
APA:
Krupke, R., Malik, S., Weber, H.B., Hampe, O., Kappes, M., & von Löhneysen, H. (2002). Patterning and visualizing self-assembled monolayers with low-energy electrons. Nano Letters, 2(10), 1161-1164. https://doi.org/10.1021/nl025679e
MLA:
Krupke, Ralph, et al. "Patterning and visualizing self-assembled monolayers with low-energy electrons." Nano Letters 2.10 (2002): 1161-1164.
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