Ammon C, Bayer A, Steinrück HP, Held G (2003)
Publication Type: Journal article
Publication year: 2003
Original Authors: Ammon Ch., Bayer A., Steinrück H.-P., Held G.
Publisher: Elsevier
Book Volume: 377
Pages Range: 163-169
DOI: 10.1016/S0009-2614(03)01127-8
The low-temperature reactivity of water (DO) adsorbed on clean and oxygen pre-covered Cu(110) was studied using high resolution X-ray photoelectron spectroscopy (HRXPS) and low energy electron diffraction (LEED). On the clean surface partial dissociation to hydroxyl was observed already at 95 K. Upon annealing to 220 K hydrogen bonded water-hydroxyl chains are formed. Upon further annealing water desorbs leaving behind a layer of hydroxyl, most of which desorbs recombinatively eventually. With pre-adsorbed oxygen water reacts to hydroxyl lifting the added-row reconstruction even below 225 K. Upon annealing this adsorbate layer passes through essentially the same stages as without pre-adsorbed oxygen. © 2003 Elsevier B.V. All rights reserved.
APA:
Ammon, C., Bayer, A., Steinrück, H.-P., & Held, G. (2003). Low-temperature partial dissociation of water on Cu(110). Chemical Physics Letters, 377, 163-169. https://doi.org/10.1016/S0009-2614(03)01127-8
MLA:
Ammon, Christian, et al. "Low-temperature partial dissociation of water on Cu(110)." Chemical Physics Letters 377 (2003): 163-169.
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