Rommel M, Spoldi G, Yanev V, Beuer S, Amon B, Jambreck J, Petersen S, Bauer AJ, Frey L (2010)
Publication Status: Published
Publication Type: Journal article, Original article
Publication year: 2010
Publisher: AVS Science and Technology Society
Book Volume: 28
Pages Range: 595-607
Journal Issue: 3
DOI: 10.1116/1.3431085
APA:
Rommel, M., Spoldi, G., Yanev, V., Beuer, S., Amon, B., Jambreck, J.,... Frey, L. (2010). Comprehensive study of focused ion beam induced lateral damage in silicon by scanning probe microscopy techniques. Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena, 28(3), 595-607. https://doi.org/10.1116/1.3431085
MLA:
Rommel, Mathias, et al. "Comprehensive study of focused ion beam induced lateral damage in silicon by scanning probe microscopy techniques." Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena 28.3 (2010): 595-607.
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