Daves W, Krauss A, Behnel N, Haeublein V, Bauer A, Frey L (2011)
Publication Status: Published
Publication Type: Journal article, Original article
Publication year: 2011
Book Volume: 519
Pages Range: 5892-5898
Journal Issue: 18
DOI: 10.1016/j.tsf.2011.02.089
APA:
Daves, W., Krauss, A., Behnel, N., Haeublein, V., Bauer, A., & Frey, L. (2011). Amorphous silicon carbide thin films (a-SiC:H) deposited by plasma-enhanced chemical vapor deposition as protective coatings for harsh environment applications. Thin Solid Films, 519(18), 5892-5898. https://doi.org/10.1016/j.tsf.2011.02.089
MLA:
Daves, W., et al. "Amorphous silicon carbide thin films (a-SiC:H) deposited by plasma-enhanced chemical vapor deposition as protective coatings for harsh environment applications." Thin Solid Films 519.18 (2011): 5892-5898.
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