Infineon Technologies Dresden GmbH & Co. KG
Industry / private company
Location:
Dresden,
Germany (DE)
ISNI: -
Synthesis and Structure of the Silver(I) Complexes [Ag2(C4H6O4N)NO3]·H2O and Ag6(C6H6O6N)2 for the Formulation of Silver Inks in Nanoimprint Lithography (2020)
Kintzel S, Eckhardt K, Getzschmann J, Bon V, Grothe J, Kaskel S
Journal article
Signal and Noise of Schottky-Junction Parallel Silicon Nanowire Transducers for Biochemical Sensing (2018)
Pregl S, Baraban L, Sessi V, Mikolajick T, Weber WM, Cuniberti G
Journal article
Continuous electrooxdiation of sulfuric acid on boron-doped diamond electrodes (2014)
Hippauf F, Doerfler S, Zedlitz R, Vater A, Kaskel S
Journal article
Influence of Antenna Shape and Resist Patterns on Charging Damage During Ion Implantation (2003)
Dirnecker T, Frey L, Bauer A, Ryssel H, Ruf A, Henke D, Beyer A
Conference contribution
Characterization of charging damage in plasma doping (2003)
Henke D, Walther S, Weemann J, Dirnecker T, Ruf A, Beyer A, Lee K
Conference contribution
Influence of photoresist pattern on charging damage during high current ion implantation (2002)
Dirnecker T, Ruf A, Frey L, Beyer A, Bauer A, Henke D, Ryssel H
Conference contribution, Conference Contribution
Plasma induced damage monitoring for HDP processes (2002)
Beyer A, Hausmann A, Junack M, Radecker J, Ruf A, Dirnecker T
Conference contribution