Fraunhofer-Institut für Integrierte Systeme und Bauelementetechnologie (IISB)

Research facility


Location: Erlangen, Germany (DE) DE

ISNI: 0000000104810543

ROR: https://ror.org/04q5rka56

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Types of publications

Journal article
Book chapter / Article in edited volumes
Authored book
Translation
Thesis
Edited Volume
Conference contribution
Other publication type
Unpublished / Preprint

Publication year

From
To

Abstract

Journal

Scalable Quantum Memory Nodes using nuclear spins in Silicon Carbide (2023) Parthasarathy SK, Kallinger B, Kaiser F, Berwian P, Dasari D, Friedrich J, Nagy R Conference contribution 4H-SiC PIN Photodiode for VUV Detection Using an Enhanced Emitter Doping Design (2023) Schraml M, Papathanasiou N, May A, Rommel M, Erlbacher T Conference contribution Integration of a humidity sensor with power electronic applications (2022) Chen W, Berwald A, Hauke A, Zimmermann V, Bayer CF, Jank MP Conference contribution Increasing flow rates in polydimethylsiloxane-based deterministic lateral displacement devices for sub-micrometer particle separation (2022) Marhenke J, Dirnecker T, Vogel N, Rommel M Journal article Improving Deep Learning-based Cardiac Abnormality Detection in 12-Lead ECG with Data Augmentation (2022) Qiu J, Oppelt M, Nissen M, Anneken L, Breininger K, Eskofier B Conference contribution Statistical investigation of dislocation induced leakage current paths in AlGaN/GaN HEMT structures on Si and the impact of growth conditions (2022) Besendoerfer S, Meissner E, Friedrich J Journal article Mesostructural impact on the macroscopic stress state and yield locus of porous polycrystalline silver (2022) Letz SA, Zhao D, März M Journal article A High-Efficiency High-Power-Density SiC-Based Portable Charger for Electric Vehicles (2022) Ditze S, Ehrlich S, Weitz N, Sauer M, Aßmus F, Sacher A, Joffe C, et al. Journal article Via Size-Dependent Properties of TiAl Ohmic Contacts on 4H-SiC (2022) May A, Rommel M, Beuer S, Erlbacher T Journal article Attenuated phase shift masks: a wild card resolution enhancement for extreme ultraviolet lithography? (2022) Erdmann A, Mesilhy H, Evanschitzky P Journal article, Review article