Ferdinand-Braun-Institut, Leibniz-Institut für Höchstfrequenztechnik (FBH)
Research facility
Location:
Berlin,
Germany (DE)
ISNI: 0000000107654240
ROR: https://ror.org/02be22443
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Erratum to "advanced thin film technology for ultrahigh resolution X-ray microscopy" [Ultramicroscopy 109 (2009) 1360-1364] (DOI:10.1016/j.ultramic.2009.07.005) (2010)
Vila-Comamala J, Jefimovs K, Raabe J, Pilvi T, Fink R, Senoner M, Maassdorf A, et al.
Journal article, Erratum
Determination of dislocation density in GaN layers using KOH defect MOVPE grown etching (2008)
Wellmann P, Sakwe A, Oehlschläger F, Hoffmann V, Zeimer U, Knauer A
Journal article