Max-Planck-Institut für Mikrostrukturphysik (MSP) / Max Planck Institute for Microstructure Physics

Research facility


Location: Halle, Germany (DE) DE

ISNI: 0000000404915558

ROR: https://ror.org/0095xwr23

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Types of publications

Journal article
Book chapter / Article in edited volumes
Authored book
Translation
Thesis
Edited Volume
Conference contribution
Other publication type
Unpublished / Preprint

Publication year

From
To

Abstract

Journal

Magnetotransport and thermopower of single Bi0.92Sb0.08 nanowires (2013) Heiderich S, Toellner W, Boehnert T, Gluschke JG, Zastrow S, Schumacher C, Pippel E, Nielsch K Journal article Stoichiometry of Nickel Oxide Films Prepared by ALD (2011) Bachmann J, Zolotaryov A, Albrecht O, Goetze S, Berger A, Hesse D, Novikov D, Nielsch K Journal article, Original article Superparamagnetic behavior in cobalt iron oxide nanotube arrays by atomic layer deposition (2011) Chong YT, Yau MYE, Yang Y, Zacharias M, Goerlitz D, Nielsch K, Bachmann J Journal article, Original article Ferromagnetism and Morphology of Annealed Fe2O3/CoXOY/ZnO Thin Films (2011) Zolotaryov A, Goetze S, Bachmann J, Goerlitz D, Hesse D, Nielsch K Journal article, Original article The Direct Writing of Plasmonic Gold Nanostructures by Electron-Beam-Induced Deposition (2011) Hoeflich K, Yang RB, Berger A, Leuchs G, Christiansen S Journal article Direct Atomic Layer Deposition of Ternary Ferrites with Various Magnetic Properties (2010) Chong YT, Yau EMY, Nielsch K, Bachmann J Journal article, Original article Multi layered Core/Shell Nanowires Displaying Two Distinct Magnetic Switching Events (2010) Chong YT, Goerlitz D, Martens S, Yau MYE, Allende S, Bachmann J, Nielsch K Journal article, Original article The Transition between Conformal Atomic Layer Epitaxy and Nanowire Growth (2010) Yang RB, Zakharov N, Moutanabbir O, Scheerschmidt K, Wu LM, Goesele U, Bachmann J, Nielsch K Journal article, Original article Electrochemical route to thermoelectric nanowires via organic electrolytes (2010) Klammer J, Bachmann J, Toellner W, Bourgault D, Cagnon L, Goesele U, Nielsch K Journal article, Original article Low temperature silicon dioxide by thermal atomic layer deposition: Investigation of material properties (2010) Hiller D, Zierold R, Bachmann J, Alexe M, Yang Y, Gerlach JW, Stesmans A, et al. Journal article, Original article