Helmholtz-Zentrum Dresden-Rossendorf (HZDR)
Research facility
Location:
Dresden,
Germany (DE)
ISNI: 0000000121580612
ROR: https://ror.org/01zy2cs03
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Low temperature silicon dioxide by thermal atomic layer deposition: Investigation of material properties (2010)
Hiller D, Zierold R, Bachmann J, Alexe M, Yang Y, Gerlach JW, Stesmans A, et al.
Journal article, Original article
Skyrme-random-phase-approximation description of E1 strength in 92100Mo (2009)
Kvasil J, Vesely P, Nesterenko VO, Kleinig W, Reinhard PG, Frauendorf S
Journal article
Density-functional investigation of the (113) [-110] twin grain boundary in Co-doped anatase Ti O2 and its influence on magnetism in dilute magnetic semiconductors (2007)
Gemming S, Janisch R, Schreiber M, Spaldin NA
Journal article