Lehrstuhl für Elektronische Bauelemente

Comparison of retrograde and conventional p-wells in regard of latch-up susceptibility (1995) Bogen S, Körber K, Gong L, Frey L, Ryssel H Journal article, Original article Investigation of the effect of altered defect structure produced by photon assisted implantation on the diffusion of As in silicon during thermal annealing (1994) Biró L, Gyulai J, Bogen S, Frey L, Ryssel H Journal article, Original article Practical aspects of ion beam analysis of semiconductor structures (1994) Frey L, Pichler P, Kasko I, Thies I, Lipp S, Streckfuss N, Gong L, Ryssel H Journal article, Original article Athermal effects in ion implanted layers (1994) Gyulai J, Ryssel H, Biró L, Frey L, Kuki A, Kormány T, Serfozo G, Khanh N Journal article, Original article Analytical description of high energy implantation profiles of boron and phosphorus into crystalline silicon (1994) Gong L, Bogen S, Frey L, Jung W, Ryssel H Journal article, Original article Photon assisted implantation (PAI) (1993) Biró L, Gyulai J, Ryssel H, Frey L, Kormány T, Tuan N, Horváth z Journal article, Original article High energy implantation of 10B and 11B into (100) silicon in channel and in random direction (1993) Bogen S, Gong L, Frey L, Ryssel H Journal article, Original article Effect of ion-beam mixing temperature on cobalt silicide formation (1993) Kasko I, Dehm C, Frey L, Ryssel H Journal article, Original article Contamination control and ultrasensitive chemical analysis (1993) Ryssel H, Frey L, Streckfuss N, Schork R, Kroninger F, Falter T Journal article, Original article Application of advanced contamination analysis for qualification of wafer handling systems and chucks (1993) Kroninger F, Streckfuss N, Frey L, Falter T, Ryzlewicz C, Pfitzner L, Ryssel H Journal article, Original article