Lehrstuhl für Elektronische Bauelemente

Substrate misorientation as additional parameter for low temperature growth of GaAs (2001) Schür C, Marek T, Strunk HP, Tautz S, Steen C, Kiesel P, Malzer S, et al. Journal article Tungsten, nickel, and molybdenum Schottky diodes with different edge termination (2001) Weiss R, Frey L, Ryssel H Journal article, Original article Barium, strontium and bismuth contamination in CMOS processes (2001) Boubekeur H, Mikolajick T, Höpfner J, Dehm C, Pamler W, Steiner J, Kilian G, et al. Authored book, Volume of book series Aspects of barium contamination in high dielectric dynamic random access memories (2000) Boubekeur H, Höpfner J, Mikolajick T, Dehm C, Frey L, Ryssel H Journal article, Original article Wafer Conserving Full Range Construction Analysis for IC Fabrication and Process Development Based on FIB /Dual Beam Inline Application (2000) Weiland R, Boit C, Dawes N, Dzieslaty A, Demm E, Ebersberger B, Frey L, et al. Conference contribution, Conference Contribution Phosphorus Ion Shower Implantation for special power IC applications (2000) Kröner F, Schork R, Frey L, Burenkov A, Ryssel H Conference contribution, Conference Contribution Investigation of molybdenum contamination in 11B+ and 31P+ implants (2000) Funk K, Häublein V, Chakor H, Ameen M, Frey L, Ryssel H, Ramirez A Conference contribution, Conference Contribution Gate oxide damage due to through the gate implantation in MOS-structures with ultrathin and standard oxides (2000) Jank M, Lemberger M, Frey L, Ryssel H Conference contribution, Conference Contribution Enhanced depth-resolution analysis with medium energy ion scattering (meis) for shallow junction profiling (2000) Tajima J, Park Y, Fujita M, Takai M, Schork R, Frey L, Ryssel H Conference contribution, Conference Contribution Defects and gallium - Contamination during focused ion beam micro machining (2000) Lehrer C, Frey L, Petersen S, Mizutam M, Takai M, Ryssel H Conference contribution, Conference Contribution