Lehrstuhl für Elektronische Bauelemente

Coupling of Equipment and Feature-Scale Profile Simulation for Dry-Etching of Polysilicon Gate Lines (2010) Baer E, Kunder D, Evanschitzky P, Lorenz J Conference contribution, Conference Contribution Mask diffraction analysis and optimization for EUV masks (2010) Erdmann A, Fühner T, Evanschitzky P Conference contribution, Conference Contribution Aerosol synthesis of silicon nanoparticles with narrow size distribution-Part 1: Experimental investigations (2010) Körmer R, Jank M, Ryssel H, Schmid HJ, Peukert W Journal article, Original article Reduced on resistance in LDMOS devices by integrating trench gates into planar technology (2010) Erlbacher T, Bauer AJ, Frey L Journal article, Original article Influence of FIB patterning strategies on the shape of 3D structures: Comparison of experiments with simulations (2010) Rommel M, Jambreck JD, Ebm C, Platzgummer E, Bauer AJ, Frey L Journal article, Original article Influence of annealing temperature and measurement ambient on TFTs based on gas phase synthesized ZnO nanoparticles (2010) Walther S, Schäfer S, Jank MPM, Thiem H, Peukert W, Frey L, Ryssel H Journal article, Original article Fabrication of metallic SPM tips by combining UV nanoimprint lithography and focused ion beam processing (2010) Jambreck JD, Schmitt H, Amon B, Rommel M, Bauer AJ, Frey L Journal article, Original article Evaluation of NbN thin films grown by MOCVD and plasma-enhanced ALD for gate electrode application in high-k/SiO2 gate stacks (2010) Hinz J, Bauer AJ, Thiede T, Fischer RA, Frey L Journal article, Original article Comprehensive study of focused ion beam induced lateral damage in silicon by scanning probe microscopy techniques (2010) Rommel M, Spoldi G, Yanev V, Beuer S, Amon B, Jambreck J, Petersen S, et al. Journal article, Original article Efficient Analysis of Three Dimensional EUV Mask Induced Imageing Artifacts Using the Waveguide Decomposition Method (2009) Shao F, Evanschitzky P, Fühner T, Erdmann A Conference contribution