Technische Fakultät

Pathfinding the perfect EUV mask (EUV) Sept. 1, 2021 - Sept. 1, 2024 Towards reliable high-temperature stable SiC CMOS technology - concepts, challenges and solutions (HT CMOS) Sept. 1, 2021 - Sept. 1, 2024 Modeling and Verification of 4H-SiC TrenchMOS integration using Trench-First-Technology Sept. 1, 2021 - Sept. 1, 2024 Modelling Nanomechanical Effects in Advanced Lithographic Materials and Processes Sept. 1, 2021 - Sept. 1, 2024 Novel Approach to SiC Power Device Fabrication: High-Purity Semi-insulating Substrates Doped by Energy-Filtered Ion Implantation Sept. 1, 2021 - Sept. 1, 2024 Deep learning applications for EUV lithographic imaging Feb. 1, 2021 - Feb. 1, 2024 Identification of interphase properties in nanocomposites Oct. 15, 2018 - Jan. 31, 2024 FOR 2271: Prozessorientiertes Toleranzmanagement mit virtuellen Absicherungsmethoden (FORTol) June 1, 2016 - Aug. 14, 2023 Consideration of functionally relevant geometric deviations in the design of metal forming processes for the production of gears by extrusion FOR 2271: Prozessorientiertes Toleranzmanagement mit virtuellen Absicherungsmethoden (FORTol) April 1, 2016 - March 31, 2023 Monolithisch integrierter Überstromschutzschalter basierend auf 4H-SiC JFET Technologie (SiC-DCBreaker) Aug. 1, 2019 - Aug. 1, 2022