Journal of Micro/Nanopatterning, Materials, and Metrology

Journal Abbreviation: JM3
ISSN: 1932-5150
eISSN: 2708-8340
Publisher: Society of Photo-optical Instrumentation Engineers (SPIE)

Publications (6)

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Journal article
Unpublished / Preprint

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Abstract

Stabilizing high aspect ratio x-ray gratings with top layer resist grid (2024) Richter M, Beckenbach T, Rauch C, Schreiner S, Zuber M, Hamann E, Last A, et al. Journal article Attenuated phase shift masks: a wild card resolution enhancement for extreme ultraviolet lithography? (2022) Erdmann A, Mesilhy H, Evanschitzky P Journal article, Review article Fabrication of X-ray absorption gratings via deep X-ray lithography using a conventional X-ray tube (2021) Pinzek S, Beckenbach T, Viermetz M, Meyer P, Gustschin A, Andrejewski J, Gustschin N, et al. Journal article Accurate prediction of EUV lithographic images and 3D mask effects using generative networks (2021) Awad A, Brendel P, Evanschitzky P, Woldeamanual DS, Rosskopf A, Erdmann A Journal article Attenuated phase shift mask for extreme ultraviolet: Can they mitigate three-dimensional mask effects? (2019) Erdmann A, Evanschitzky P, Mesilhy HMS, Philipsen V, Hendrickx E, Bauer M Journal article Inkjetable and photo-curable resists for large-area and high-throughput roll-to-roll nanoimprint lithography (2014) Thesen MW, Nees D, Ruttloff S, Rumler M, Rommel M, Schlachter F, Grützner S, et al. Journal article